Nanoscale characterization of ultra-thin tungsten films deposited by radio-frequency magnetron sputtering

Martínek, Tomáš; Kudělka, Josef; Navrátil, Milan; Křesálek, Vojtěch; Fejfar, Antonín; Hývl, Matěj; Sobota, Jaroslav

Title:	Nanoscale characterization of ultra-thin tungsten films deposited by radio-frequency magnetron sputtering
Author:	Martínek, Tomáš; Kudělka, Josef; Navrátil, Milan; Křesálek, Vojtěch; Fejfar, Antonín; Hývl, Matěj; Sobota, Jaroslav
Document type:	Conference paper (English)
Source document:	IEEE-NANO 2015 - 15th International Conference on Nanotechnology. 2015, p. 510-513
ISBN:	978-1-4673-8156-7
DOI:	https://doi.org/10.1109/NANO.2015.7388651
Abstract:	In this article, atomic force microscopy was used for nanoscale characterization of ultra-thin tungsten films which were deposited on silicon substrate. Radio-frequency magnetron sputtering was used for tungsten deposition on the surface. © 2015 IEEE.
Full text:	http://ieeexplore.ieee.org/document/7388651/
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Citace článku v konferenčním sborníku:
MARTÍNEK, Tomáš, Josef KUDĚLKA, Milan NAVRÁTIL, Vojtěch KŘESÁLEK, Antonín FEJFAR, Matěj HÝVL a Jaroslav SOBOTA. Nanoscale characterization of ultra-thin tungsten films deposited by radio-frequency magnetron sputtering. In: IEEE-NANO 2015 - 15th International Conference on Nanotechnology [online]. Rome: Institute of Electrical and Electronics Engineers (IEEE), 2015, s. 510-513. [cit. 2025-10-31]. Dostupné z: http://ieeexplore.ieee.org/document/7388651/.

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